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国家自然科学基金(10075029)

作品数:8 被引量:9H指数:2
相关作者:陈培毅贾宏勇钱佩信孟祥提王吉林更多>>
相关机构:清华大学更多>>
发文基金:国家自然科学基金更多>>
相关领域:电子电信自动化与计算机技术理学更多>>

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8 条 记 录,以下是 1-9
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DC Characteristics of Gamma-ray Irradiated SiGe HBT in Comparison with Si BJT
2006年
The changes of DC characteristics of SiGe HBT after being submitted to γ-ray irradiation of 700 krad, 7 000 krad and 10 000 krad were compared to those of Si BJT. Generally speaking, Ib and Ib- Ib0 increase with the doses increasing. For SiGe HBT, with the doses increasing, Ic and Ic-Ic0 as well as the related changes of the current gain (β) will decrease at higher Vbe, while for Si BJT, with the doses increasing, after irradiation, Ib and Ic-Ic0 increase; ,8 and its related changes also decrease with their differences, however, tending to be very small at high doses of 7 000 krad and 10 000 krad. Moreover, given the same doses, the decreases of,a are much larger than SiGe HBT, which shows that SiGe HBT's anti-radiation performance proves to be better than Si BJT. Still, in SiGe HBT, some strange phenomena were observed: Ic-Ic0 will increase after the radiation of 7 000 krad in less than 0.65 V and as will ,8 in less than 0.75 V. The mechanism of radiation-induced change in DC characteristies was also discussed.
MENG Xiang-tiHUANG QianWANG Ji linCHEN Pei-yiTSIEN Pei-hsin
辐照对SiGe HBT增益的影响
2007年
比较了电子和γ射线辐照后SiGe HBT和Si BJT直流增益β的变化.在Vbe≤0.5V时,较高剂量辐照时SiGe HBT的放大倍数辐照损伤因子d(β)为负;在Vbe≥0.5V时,SiGe HBT的d(β)远比Si BJT的小.SiGe HBT有更好的抗辐照性能.针对测得的一些电子陷阱对辐照致性能变化的影响进行了讨论.
孟祥提王吉林黄强贾宏勇陈培毅钱佩信
关键词:HBT电子辐照Γ射线辐照BJT直流增益
阶梯变掺杂漂移区高压SOI RESURF结构耐压机理研究被引量:2
2006年
研究了阶梯变掺杂漂移区高压SOI RESURF(Reduce SURface Field)结构的器件几何形状和物理参数对器件耐压的影响;发现并解释了该结构纵向击穿时,耐压与浓度关系中特有的“多RESURF平台”现象。研究表明,阶梯变掺杂漂移区结构能明显改善表面电场分布,提高耐压,降低导通电阻,增大工艺容差;利用少数分区,能得到接近线性变掺杂的耐压,降低了工艺难度。
毛平陈培毅
关键词:SOIRESURF结构
Difference in electron-and gamma-irradiation effects on output characteristic of color CMOS digital image sensors
2004年
Changes of the average brightness and non-uniformity of dark output images,and quality of pictures captured under natural lighting for the color CMOS digital image sensorsirradiated at different electron doses have been studied in comparison to those from theγ-irradiated sensors. For the electron-irradiated sensors, the non-uniformity increases obviouslyand a small bright region on the dark image appears at the dose of 0.4 kGy. The average brightnessincreases at 0.4 kGy, increases sharply at 0.5 kGy. The picture is very blurry only at 0.6 kGy,showing the sensor undergoes severe performance degradation. Electron radiation damage is much moresevere than γ radiation damage for the CMOS image sensors. A possible explanation is presented inthis paper.
MENGXiangtiKANGAiguoZHANGXiminLIJihongHUANGQiangLIFengmeiLIUXiaoguangZHOUHongyu
关键词:SI
SiGe HBT和Si BJT的γ射线辐照效应比较被引量:1
2002年
比较了经剂量为400 krad(Si)的γ射线辐照后SiGe HBT和Si BJT直流电学性能的变化。 通常SiGe HBT辐照后的Ib增加,Ic下降,直流放大倍数变化很小;Si BJT辐照后的Ib增加,而Ic通常也增加,并且变化幅度很大,直流放大倍数明显下降,相同剂量下变化幅度比SiGe HBT约高一个量级。表明SiGe HBT比Si BJT有更好的抗辐照性能,并对辐照导致的电特性的变化原因进行了初步解释。
康爱国孟祥提王吉林贾宏勇陈培毅钱佩信
关键词:HBTSIBJT
A study of radiation effects of 9 and 12 MeV protons on Chinese CMOS image sensor degradation
2008年
The 9 and 12 MeV proton irradiations of the Chinese CMOS Image Sensor in the fluence range from 1× 10^9 to 4×10^10 cm^-2 and 1 × 10^9 to 2×10^12 cm^-2 have been carried out respectively. The color pictures and dark output images are captured, and the average brightness of dark output images is calculated. The anti-irradiation fluence thresholds for 9 and 12 MeV protons are about 4×10^l0 and 2×10^12 cm^-2, respectively. These can be explained by the change of the concentrations of irradiation-induced electron-hole pairs and vacancies in the various layers of CMOS image sensor calculated by the TRIM simulation program.
孟祥提黄强马艳秀郑永男范平朱升云
γ射线辐照对数字型彩色CMOS图像传感器输出特性的影响
研究了数字型彩色CMOS图像传感器的γ射线辐照效应。采用不同γ射线注量进行积累辐照和单次辐照。积累辐照后捕获的图像在1.2kGy时变得非常差,而单次辐照后图像在1.8kGy时才变得非常差。积累辐照由于类似加电模式而比单次...
孟祥提康爱国黄强
关键词:半导体CMOS图像传感器辐照效应
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Electrical Performance of Electron Irradiated SiGe HBT and Si BJT被引量:1
2004年
The change of electrical performances of 1 MeV electron irradiated silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) and Si bipolar junction transistor (BJT) was studied. After electron irradiation, both the collector current IC and the base current IB changed a little, and the current gain β decreased a little for SiGe HBT. The higher the electron irradiation fluence was, the lower the IC decreased. For conventional Si BJT, IC and IB increased as well as /? decreased much larger than SiGe HBT under the same fluence. The contribution of IB was more important to the degradation of β for both SiGe HBT and Si BJT. It was shown that SiGe HBT had a larger anti-radiation threshold and better anti-radiation performance than Si BJT. The mechanism of electrical performance changes induced by irradiation was preliminarily discussed.
WentaoHUANGJilinWANGZhinongLIUPeiyiCHENPeihsinTSIENXiangtiMENG
Dark output characteristic of γ-ray irradiated CMOS digital image sensors被引量:5
2002年
The quality of dark output images from the CMOS (complementarymetal oxide semiconductor) black and white (B & W) digital imagesensors captured before and after γ-ray irradiation was studied. Thecharacteristic parameters of the dark output images captured atdifferent radiation dose, e.g. average brightness and itsnon-uniformity of dark out- put images, were analyzed by our testsoftware. The primary explanation for the change of the parameterswith the radi- ation dose was given.
MENG Xiangti and KANG A iguo Institute of Nuclear Energy Technology, Tsinghua University, Beijing 100084, China
关键词:SI
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