A theoretical calculation of the miscibility gap with considering the mismatch strain and elastic parameters was performed for the GaN1-xPx ternary alloys on (0001) GaN/sapphire substrates based on the strictly regular solution model. The calculated results show that the boundary of the spinodal isotherm shifts from x=0.06 to x=0.25 at the growth temperature of 1200 K as the strain factor increases from 0 to 1, indicating that the strain in the GaN1-xPx layers can suppress the phase separation. Meanwhile, with the increase of the effective elastic parameters of GaN and GaP, the available maximum P content also increases slightly at the growing temperature.
Zhang Kaixiao Chen Dunjun Zhu Weihua Lin Jianwei Zhang Rong Zheng Youdou
By using temperature-dependent current–voltage, variable-frequency capacitance–voltage, and Hall measurements,the effects of the thermal oxidation on the electrical properties of Ni/Au Schottky contacts on lattice-matched In0.18Al0.82N/GaN heterostructures are investigated. Decrease of the reverse leakage current down to six orders of magnitude is observed after the thermal oxidation of the In0.18Al0.82N/GaN heterostructures at 700oC. It is confirmed that the reverse leakage current is dominated by the Frenkel–Poole emission, and the main origin of the leakage current is the emission of electrons from a trap state near the metal/semiconductor interface into a continuum of electronic states associated with the conductive dislocations in the InxAl1-xN barrier. It is believed that the thermal oxidation results in the formation of a thin oxide layer on the InxAl1-xN surface, which increases the electron emission barrier height.
