An increase of work function （0.3 eV） is achieved by irradiating poly（3,4-ethylenedioxythiophene）：poly（styrene sul- fonate） （PEDOT：PSS） film in vacuum with 254-nm ultraviolet （UV） light. The mechanism for such an improvement is investigated by photoelectron yield spectroscopy, X-ray photo electron energy spectrum, and field emission technique. Sur- face oxidation and composition change are found as the reasons for work function increase. The UV-treated PEDOT：PSS film is used as the hole injection layer in a hole-only device. Hole injection is improved by UV-treated PEDOT：PSS film without baring the enlargement of film resistance. Our result demonstrates that UV treatment is more suitable for modifying the injection barrier than UV ozone exposure.
Graphene is considered as a promising material to construct field-effect transistors (FETs) for high frequency electronic applications due to its unique structure and properties,mainly including extremely high carrier mobility and saturation velocity,the ultimate thinnest body and stability.Through continuously scaling down the gate length and optimizing the structure,the cut-off frequency of graphene FET (GFET) was rapidly increased and up to about 300 GHz,and further improvements are also expected.Because of the lack of an intrinsic band gap,the GFETs present typical ambipolar transfer characteristic without off state,which means GFETs are suitable for analog electronics rather than digital applications.Taking advantage of the ambipolar characteristic,GFET is demonstrated as an excellent building block for ambipolar electronic circuits,and has been used in applications such as highperformance frequency doublers,radio frequency mixers,digital modulators,and phase detectors.
采用高纯半导体碳纳米管薄膜和石墨烯构建复合结构光探测器,研究其光电响应特性。结果表明,在光照下,顶层石墨烯中的光生载流子通过碳纳米管与石墨烯之间薄的非晶硅层,隧穿至底层的碳纳米管薄膜中,在非晶硅层两侧分别富集电子和空穴,形成光致栅压(Photogating),有效地改变了碳纳米管薄膜晶体管的电流。器件在可见光(633 nm)条件下得到响应度为83 m A/W,并在近红外波段范围内仍保持好的光响应特性。由于石墨烯具有宽谱光吸收特性,半导体碳纳米管薄膜晶体管具有小的暗电流,碳纳米管–石墨烯复合光探测器发挥了两种材料的优势,为今后高性能宽谱光电探测器的制备奠定了基础。
Ballistic n-type carbon nanotube(CNT)-based field-effect transistors(FETs) have been fabricated by contacting semiconducting single-walled CNTs(SWCNTs) using Sc or Y.The n-type CNT FETs were pushed to their performance limits through further optimizing their gate structure and insulator.The CNT FETs outperformed n-type Si metal-oxide-semiconductor(MOS) FETs with the same gate length and displayed better downscaling behavior than the Si MOS FETs.Together with the demonstration of ballistic p-type CNT FETs using Pd contacts,this technological advance is a step toward the doping-free fabrication of CNT-based ballistic complementary metal-oxide-semiconductor(CMOS) devices and integrated circuits.Taking full advantage of the perfectly symmetric band structure of the semiconductor SWCNT,a perfect SWCNT-based CMOS inverter was demonstrated,which had a voltage gain of over 160.Two adjacent n-and p-type FETs fabricated on the same SWCNT with a self-aligned top-gate realized high field mobility simultaneously for electrons(3000 cm2 V-1 s-1) and holes(3300 cm2 V-1 s-1).The CNT FETs also had excellent potential for high-frequency applications,such as a high-performance frequency doubler.
Semiconducting carbon nanotubes(CNTs) possess outstanding electrical and optical properties because of their special one-dimen-sional(1D) structure.CNTs are direct bandgap materials,which makes them ideal for use in optoelectronic devices,e.g.light emitters and light detectors.Excitons determine their light absorption and light emission processes due to the strong Coulomb interactions between electrons and holes in CNTs.In this paper,we review recent progress in CNT photodetectors,photovoltaic devices and light emitters.In particular,we focus on the doping-free CNT optoelectronic devices developed by our group in recent years.
