TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties and wear resistance of the films. The results showed that the magnetic field puts much effect on the preferred orientation, chemical composition, hardness and wear resistance of TiN films. The preferred orientation of the TiN films changed from（111） to（220） and finally to the coexistence of（111） and（220） texture with the increase in the applied magnetic field intensity. The concentration of N atoms in the TiN films increases with the magnetic field intensity, and the concentration of Ti atoms shows an opposite trend. At first, the hardness and elastic modulus of the TiN films increase and reach a maximum value at 5 m T and then decrease with the further increase in the magnetic field intensity. The high hardness was related to the N/Ti atomic ratio and to a well-pronounced preferred orientation of the（111） planes in the crystallites of the film parallel to the substrate surface. The wear resistance of the Ti N films was significantly improved with the application of the magnetic field, and the lowest wear rate was obtained at magnetic field intensity of 5 m T. Moreover, the wear resistance of the films was related to the hardness H and the H3/E＊2 ratio in the manner that a higher H3/E＊2 ratio was conducive to the enhancement of the wear resistance.
针对磁控溅射和阴极弧离子镀沉积技术存在的局限性,采用有限元分析方法(Finite element method,FEM)进行磁场模拟,优化设计外加电磁线圈的结构和磁场分布位形,并应用于磁控溅射沉积透明导电氧化物和阴极弧离子镀沉积硬质薄膜中。分析了外加电磁线圈磁场对磁控溅射等离子体辉光变化、磁控靶磁场平衡度/非平衡度、以及线圈位置对等离子体特性和靶材利用率的影响。设计和制作了轴对称磁场和旋转磁场,研究了它们对阴极弧离子镀弧斑运动形貌和薄膜表面大颗粒等特性的影响。通过控制弧斑运动状态,可以得到不同程度的颗粒分布,实现颗粒的可控沉积,减少薄膜表面大颗粒的污染。
