Al2O3and HfO2thin films are separately deposited on n-type InAlAs epitaxial layers by using atomic layer deposition(ALD).The interfacial properties are revealed by angle-resolved x-ray photoelectron spectroscopy(AR-XPS).It is demonstrated that the Al2O3layer can reduce interfacial oxidation and trap charge formation.The gate leakage current densities are 1.37×106A/cm2and 3.22×106A/cm2at+1V for the Al2O3/InAlAs and HfO2/InAlAs MOS capacitors respectively.Compared with the HfO2/InAlAs metal-oxide-semiconductor(MOS) capacitor,the Al2O3/InAlAS MOS capacitor exhibits good electrical properties in reducing gate leakage current,narrowing down the hysteresis loop,shrinking stretch-out of the C-V characteristics,and significantly reducing the oxide trapped charge(Qot) value and the interface state density(Dit).
The prospect ofα-Ga2O3 in optical and electrical devices application is fascinating.In order to obtain better performance,Ge and F elements with similar electronegativity and atomic size are selected as dopants.Based on density functional theory(DFT),we systematically research the electronic structure and optical properties of dopedα-Ga2O3 by GGA+U calculation method.The results show that Ge atoms and F atoms are effective n-type dopants.For Ge-dopedα-Ga2O3,it is probably obtained under O-poor conditions.However,for F-dopedα-Ga2O3,it is probably obtained under O-rich conditions.The doping system of F element is more stable due to the lower formation energy.In this investigation,it is found that two kinds of doping can reduce theα-Ga2O3 band gap and improve the conductivity.What is more,it is observed that the absorption edge after doping has a blue shift and causes certain absorption effect on the visible region.Through the whole scale of comparison,Ge doping is more suitable for the application of transmittance materials,yet F doping is more appropriate for the application of deep ultraviolet devices.We expect that our research can provide guidance and reference for preparation ofα-Ga2O3 thin films and photoelectric devices.
