The in-plane optical anisotropic properties of the non-polar a-plane GaN films grown by metal organic chemical vapour deposition are investigated by using polarised photoluminescence(PL),optical transmission and Raman scattering measurements.Through polarised PL and transmission spectra,the in-plane optical anisotropic properties of a-plane GaN film are found,which are attributed to the topmost valance band(atΓpoint)split into three sub-bands under anisotropic strain.The PL spectra also exhibit that the light hole band moves up more rapidly than the spin-orbit crystal-field spilt-off hole band with the increasing in-plane anisotropic compressive strain.Raman scattering spectra under different configurations further indicate the in-plane anisotropy and the hexagonal crystalline structure of these a-plane GaN films.
Effect of the V/III ratio during buffer layer growth on the yellow and blue luminescence in undoped GaN epilayer has been studied by means of photoluminescence spectroscopy and high resolution X-ray diffraction.It is found that the densities of screw and edge threading dislocations increase with the V/III ratio of the buffer layer,and the intensities of the yellow luminescence(YL) and blue luminescence(BL) emissions also increase dramatically.However,the density ratio of the edge threading dislocation to the screw threading dislocation remains invariant,as well as the intensity ratio of YL emission to BL emission.It can be concluded from these phenomena that the edge threading dislocation and screw threading dislocation can enhance the YL and BL emissions,respectively.
To understand the mechanism of Gallium nitride (GaN) film growth is of great importance for their potential applica- tions. In this paper, we investigate the growth behavior of the GaN film by combining computational fluid dynamics (CFD) and molecular dynamics (MD) simulations. Both of the simulations show that V/III mixture degree can have important impacts on the deposition behavior, and it is found that the more uniform the mixture is, the better the growth is. Besides, by using MD simulations, we illustrate the whole process of the GaN growth. Furthermore, we also find that the V/III ratio can affect the final roughness of the GaN film. When the V/III ratio is high, the surface of final GaN film is smooth. The present study provides insights into GaN growth from the macroscopic and microscopic views, which may provide some suggestions on better experimental GaN preparation.
The m-plane InN (1100) epilayers have been grown on a LiAlO2 (100) substrate by a two-step growth method using a metal-organic chemical vapor deposition (MOCVD) system. The low temperature InN buffer layer (LT-InN) is introduced to overcome the drawbacks of thermal instability of LiAlO2 (LAO) and to relieve the strains due to a large thermal mismatch between LAO and InN. Then the high temperature m-plane InN (1100) epilayers (HT-InN) were grown. The results of X-ray diffraction (XRD) suggest that the m-plane InN (1100) epilayer is a single crystal. The X-ray rocking curves (scans) (XRC) and atomic force microscopy (AFM) indicate that the m-plane InN (1100) epilayer has anisotropic crystallographic properties. The PL studies of the materials reveal a remarkable energy band gap structure around 0.70 eV at 15 K.
A significant enhancement in solar hydrogen generation efficiency has been achieved by inductive coupled etching(ICP) surface roughening treatment using nano-sized nickel mask. As much as 7 times improvement of photocurrent is demonstrated in comparison with a planar one fabricated from the same parent wafer. Under identical illumination conditions in HBr solution, the incident photon conversion efficiency(IPCE) shows an enhancement with a factor of 3, which even exceed 54% at 400 nm wavelength. We believe the enhancement is attributed to several facts including improvement in absorption, reacting area, carrier localization and carrier lifetime.
In_(x)Ga_(1-x)N alloys with low indium composition x in the range 0.13 ≤ x ≤ 0.23 are systematically studied mainly based on a Raman scattering technique.Scanning electron microscopy and x-ray diffraction results show that our samples can be divided into two groups:pseudomorphic (0.13 ≤ x ≤ 0.16) and relaxed (0.18 ≤ x ≤ 0.23).The prominent enhancement of A1 longitudinal-optical (LO) mode is found with 325nm laser excitation.For pseudomorphic samples,the frequencies of A1 (LO) phonons agree well with the theoretical predictions,which verifies that the samples are fully strained.For relaxed In_(x)Ga_(1-x)N samples,a linear dependence of the A1 (LO) mode frequency is obtained:Ωo(x) =(740.8 ± 3.3) - (143.1 ± 16.0)x,which is the evidence of one-mode behavior in In_(x)Ga_(1-x)N ternary alloys.Residual strains in these partially relaxed samples are also evaluated.
Uniform GaN nanopillar arrays have been successfully fabricated by inductively coupled plasma etching using self-organized nickel nano-islands as the masks on GaN/sapphire.GaN nanopillars with diameters of 350 nm and densities of 2.6 108 cm..2 were demonstrated and controlled by the thickness of Ni film and the NH3 annealing time.These GaN nanopillars show improved optical properties and strain change compared to that of GaN film before ICP etching.Such structures with large-area uniformity and high density could provide additional advantages for light emission of light-emitting diodes,quality improvement of ELO regrowth,etc.
