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国家自然科学基金(11274155)

作品数:6 被引量:7H指数:2
相关作者:单丹季阳张培李伟姜素霞更多>>
相关机构:南京大学中国电子科技集团公司第三十八研究所郑州轻工业学院更多>>
发文基金:国家自然科学基金国家重点基础研究发展计划博士科研启动基金更多>>
相关领域:理学电子电信一般工业技术机械工程更多>>

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6 条 记 录,以下是 1-10
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高电导掺硼富硅碳化硅薄膜的光电特性研究
<正>包含有纳米硅颗粒的富硅碳化硅(nc-Si/SiCx)薄膜由于其带隙可调等诸多特性,在硅基光电器件中有着很好的应用前景。已有报道指出,由于硼掺杂的ncSi/SiCx材料具有较宽的带隙(2.2 e V)和较高的电导率(...
季阳单丹翟颖颖徐骏李伟陈坤基
关键词:硼掺杂光电特性
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磷掺杂纳米硅/二氧化硅多层膜材料的电学输运性质研究
<正>半导体纳米硅材料由于在未来许多新型器件中有着重要的应用前景,因此在过去几十年被广泛地研究,但绝大多数研究都是针对非故意掺杂的纳米硅材料。对于发展基于纳米硅材料的新型纳电子与光电子器件而言,是否可以通过掺杂调控纳米硅...
钱明庆单丹季阳翟颖颖徐骏李伟徐岭陈坤基
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Si nanocrystals-based multilayers for luminescent and photovoltaic device applications被引量:2
2018年
Low dimensional Si materials have attracted much attention because they can be developed in many kinds of new-generation nano-electronic and optoelectronic devices, among which Si nanocrystals-based multilayered material is one of the most promising candidates and has been extensively studied. By using multilayered structures, the size and distribution of nanocrystals as well as the barrier thickness between two adjacent Si nanocrystal layers can be well controlled, which is beneficial to the device applications. This paper presents an overview of the fabrication and device applications of Si nanocrystals, especially in luminescent and photovoltaic devices. We first introduce the fabrication methods of Si nanocrystals-based multilayers. Then, we systematically review the utilization of Si nanocrystals in luminescent and photovoltaic devices. Finally, some expectations for further development of the Si nanocrystals-based photonic and photovoltaic devices are proposed.
Peng LuDongke LiYunqing CaoJun XuKunji Chen
关键词:SINANO候选人
Fabrication of Anti-reflecting Si Nano-structures with Low Aspect Ratio by Nano-sphere Lithography Technique被引量:1
2013年
Nano-structured photon management is currently an interesting topic since it can enhance the optical absorption and reduce the surface reflection which will improve the performance of many kinds of optoelectronic devices, such as Si-based solar cells and light emitting diodes. Here, we report the fabrication of periodically nano-patterned Si structures by using polystyrene nano-sphere lithography technique. By changing the diameter of nano-spheres and the dry etching parameters, such as etching time and etching power, the morphologies of formed Si nano-structures can be well controlled as revealed by atomic force microscopy.A good broadband antireflection property has been achieved for the formed periodically nano-patterned Si structures though they have the low aspect ratio(<0.53). The reflection can be significantly reduced compared with that of flat Si substrate in a wavelength range from 400 nm to 1200 nm. The weighted mean reflection under the AM1.5 solar spectrum irradiation can be as low as 3.92% and the corresponding optical absorption is significantly improved, which indicates that the present Si periodic nano-structures can be used in Si-based thin film solar cells.
Shenghua SunPeng LuJun XuLing XuKunji ChenQimin WangYuhua Zuo
关键词:ANTIREFLECTION
Energy transfer process between Eu^(3+) and wide-band-gap SnO_2 nanocrystals in silica films studied by photoluminescence excitation and time-resolved photoluminescence techniques被引量:2
2014年
Eu3+ions embedded in silica thin films codoped with SnO2 nanocrystals were fabricated by sol–gel and spin-coating methods.SnO2 nanocrystals with controllable sizes were synthesized through precisely controlling the Sn concentrations.The influences of doping and annealing conditions on the photoluminescence intensity from SnO2 nanocrystals are systematically investigated.The effective energy transfer from the defect states of SnO2nanocrystals to nearby Eu3+ions has revealed by the selective photoluminescence excitation spectra.The efficiency of the Forster resonance energy transfer is evaluated by the time-resolved photoluminescence measurements,which is about 29.1%based on the lifetime tests of the SnO2emission.
Xiaowei ZhangPei ZhangShaobing LinJun XuTao LinLing XuKunji Chen
关键词:SNO2纳米晶铕离子
nc-Ge/SiNx多层膜材料的可调控非线性光学特性
2016年
采用等离子体增强化学气相沉积和后退火的方法制备了纳米锗/氮化硅(nc-Ge/SiN_x)多层薄膜。借助Raman光谱仪对其微结构进行表征,测得样品的晶化率大于46%。由样品的光吸收谱可知,nc-Ge的尺寸越小,其光学带隙越大。利用Z扫描技术对样品的非线性光学特性进行研究,以波长为1 064 nm、脉宽为25 ps的锁模激光作为激发光,测得样品的非线性折射率系数在10^(-10)cm^2/W数量级。实验结果表明,通过改变nc-Ge的尺寸可以使材料的非线性光学折射率由自散焦转变为自聚焦特性,而负的非线性折射率系数可归因于两步吸收产生的自由载流子散射效应。当激发光强增大时,在锗层厚度为6 nm的多层膜中同时存在两步吸收过程和饱和吸收过程。两种非线性光学吸收过程之间的竞争是样品呈现不同非线性光学特性的主要原因。
李悰张培姜利英陈青华闫艳霞姜素霞
Improved photovoltaic properties of Si quantum dots/SiC multilayers-based heterojunction solar cells by reducing tunneling barrier thickness被引量:2
2013年
Yun-Qing CAO Xin XU Shu-Xin LI Wei LI Jun XU Kunji CHEN
关键词:硅量子点SIC等离子体增强化学气相沉积
高K介质隧穿层对纳米硅浮栅存储结构性能的优化研究
现阶段存储器正在朝着高密度、高速度、低功耗的方向迅速发展,给人们的生活带来极大的方便。纳米硅浮栅存储器作为新一代非挥发浮栅存储器,其性能的优化研究是当前的主要研究方向。其中热处理由于可以解决界面、陷阱等问题成为制备工艺过...
王文
关键词:氧化铝薄膜
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镶嵌于非晶碳化硅中的高导电性掺杂纳米晶硅的制备与电学性能研究
2016年
对不同C/Si比的掺磷非晶碳化硅薄膜的光电性质进行了研究.发现对于原始样品,随着C/Si比的减小,材料的光学带隙逐渐减小,暗电导率逐渐增大.对于1000℃退火后的样品,材料的暗电导率有了6到7个数量级的提高.随着膜中C/Si比的减小,材料中Si-C键密度逐渐减少,结晶度提高,光学带隙有所增大,多数载流子迁移率增大,暗电导率逐渐增大.此外,薄膜中组分比的改变对材料中掺杂磷原子的激活效率以及材料的电导率激活能等都会产生相应影响.随着C/Si比的减小,退火后样品的掺杂磷原子的激活效率随之改变,表现为载流子浓度先增大后减小的趋势,这与材料的结晶程度有很大的关系.退火后样品的电导率激活能随着C/Si比的减小而逐渐减小,费米能级逐渐靠近导带底,最后位于导带底甚至进入导带,使材料表现为重掺杂的特性.
季阳单丹钱明庆李伟徐骏陈坤基
关键词:纳米晶碳化硅电学性质
基于纳米线阵列的纳米硅/二氧化硅多层膜发光器件
<正>为了实现全硅基的单片光电集成,基于纳米硅量子点的高效发光器件一直是人们研究的重点之一。虽然目前人们已经制备出了硅基发光器件,但由于器件的发光强度仍然较低,因此,如何提高基于纳米硅材料的发光器件的发光效率就成为一个当...
翟颖颖曹蕴清李东珂陆鹏李伟徐骏陈坤基
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